The only unique two-beam scanning electron / ion microscope in Russia ZEISS CrossBeam 340 equipped with an Oxford Instruments X-Max 80 X-ray microanalyzer. The microscope allows you to obtain images and conduct chemical analysis of objects with nanometer resolution. This is a prerequisite for the design of new functional materials and coatings for products in various industries. A special feature of CrossBeam 340 is the ability to study non-conductive samples (including polymers and biomaterials) in low vacuum mode. The presence of a modern Ga ion source, which is unique for the South of Russia, makes it possible to carry out nanomodification of the surface in order to obtain materials with qualitatively new properties.

Chamber and Sample Stage Specifications:

  • Maximum sample size: diameter up to 150 mm, thickness up to 55 mm
  • Accuracy of movement and repeatability of position: 2 μm
  • Travel ranges: X: 100 mm, Y: 100 mm, Z: 50 mm, Tilt: -5 – 70̊, Rotation: 360̊
  • There is a holder for silicon wafers
  • Working high vacuum in the chamber — 2х10-5 Pa
  • Low vacuum range in the chamber — from 10 to 65 Pa
  • Working high vacuum in guns — 2х10-8 Pa

Features of the Zeiss Gemini electronic column:

  • Cathode type – Schottky field emission cathode
  • Beam current stability – 0.2% / hour, 0.4% / day
  • Accelerating voltage – 20 to 30,000 V
  • Resolution at accelerating voltage 15 kV, 30 kV – 1.0 nm
  • Resolution at an accelerating voltage of 1 kV – 1.9 nm
  • Built-in secondary (SE) and backscattered (BSE) electron detectors
  • Side-by-side secondary electron detector (BSE)
  • Secondary electron detector for low vacuum operation
  • Absorbed current detector with probe current measurement
  • 2 IR cameras with adjustable IR illumination

Characteristics of the ion-optical column / gun:

  • Ga + ion source
  • Mechanical adjustment of the source position relative to the optical axis and a system for correcting beam astigmatism
  • Ion gun accelerating voltage – from 500 to 30,000 V
  • Interchangeable automatic system of 14 apertures
  • Time for changing apertures while maintaining the initially adjusted beam parameters for each aperture – 15 seconds
  • Operating current range for the ion column – from 1 pA to 100 nA
  • Full range of magnifications without distorting sample geometry and without using distorted fisheye display modes – from 300 x to 500,000 x
  • The resolution of the ion column at an accelerating voltage of 30 kV – 3.0 nm

Characteristics of the X-ray spectral energy dispersive microanalyzer (EMF):

  • detector area – 80 mm2
  • energy resolution for the manganese Kα line (FWHM) – 127 eV
  • qualitative analysis range – from Be to Am
  • quantitative analysis range – from Be to U
  • number of processor pulse channels – 4096
  • shifts of analytical lines when changing the count rate from 1,000 counts / s to 100,000 counts / s – do not exceed 1 eV
  • the ability to control the electron beam and the table of SEM samples from the EDS analysis program
  • function of constructing a profile of elements along a given line on a sample
  • quantitative elemental mapping function
  • set of 55 NIST-certified standards for EDS analysis
  • test object for verification of electron / ion gun resolution and magnification
  • software module for non-destructive characterization of the thicknesses of thin films on the sample surface with their different elemental composition